Invention Grant
- Patent Title: Low pressure wire ion plasma discharge source, and application to electron source with secondary emission
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Application No.: US16070785Application Date: 2017-01-12
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Publication No.: US10763070B2Publication Date: 2020-09-01
- Inventor: Paul Ceccato , Hervé Besaucèle
- Applicant: LASER SYSTEMS & SOLUTIONS OF EUROPE
- Applicant Address: FR Gennevilliers
- Assignee: LASER SYSTEMS & SOLUTIONS OF EUROPE
- Current Assignee: LASER SYSTEMS & SOLUTIONS OF EUROPE
- Current Assignee Address: FR Gennevilliers
- Agency: Nixon & Vanderhye
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1c62ae11
- International Application: PCT/EP2017/050596 WO 20170112
- International Announcement: WO2017/125315 WO 20170727
- Main IPC: H01J35/08
- IPC: H01J35/08 ; H01J35/20 ; H01S3/0971 ; H01J35/04 ; H01J47/02 ; H05H1/24
Abstract:
Disclosed is a low pressure wire ion plasma discharge source including an elongated ionization chamber housing at least two parallel anode wires extending longitudinally within the ionization chamber. A first of the at least two anode wires is connected to a DC voltage supply and a second of the at least two anode wires is connected to a pulsed voltage supply.
Public/Granted literature
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