Invention Grant
- Patent Title: Surface-treated copper foil, manufacturing method therefor, printed circuit board copper-clad laminate, and printed circuit board
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Application No.: US15567166Application Date: 2016-03-24
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Publication No.: US10763002B2Publication Date: 2020-09-01
- Inventor: Yoshinori Matsuura
- Applicant: MITSUI MINING & SMELTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: MITSUI MINING & SMELTING CO., LTD.
- Current Assignee: MITSUI MINING & SMELTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5532b03a
- International Application: PCT/JP2016/059464 WO 20160324
- International Announcement: WO2016/174970 WO 20161103
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H01B1/02 ; C23C14/06 ; H05K3/38 ; H05K3/02 ; B32B15/04 ; H01B3/46 ; H01B7/02

Abstract:
There is provided a copper foil having a surface coating layer that can achieve a high bonding strength to a resin layer even if the copper foil has an extremely smooth surface such as one formed by vapor deposition, for example, sputtering and also has a desirable insulation resistance suitable for achieving a fine pitch in a printed wiring board. A surface-treated copper foil according to the present invention includes a copper foil and a silicon-based surface coating layer provided on at least one surface of the copper foil, the silicon-based surface coating layer being mainly composed of silicon (Si). The silicon-based surface coating layer has a carbon content of 1.0 to 35.0 atomic % and an oxygen content of 12.0 to 40.0 atomic % relative to a total content in 100 atomic % of carbon (C), oxygen (O) and silicon (Si) elements as measured by X-ray photoelectron spectroscopy (XPS).
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