Invention Grant
- Patent Title: Optical arrangement, in particular lithography system, with a transport lock
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Application No.: US16511154Application Date: 2019-07-15
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Publication No.: US10761436B2Publication Date: 2020-09-01
- Inventor: Ralf Zweering , Steffen Fritzsche , Hendrik Wagner , Florian Ahles , Jens Prochnau , Michael Erath , Viktor Kulitzki , Marwène Nefzi
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@37c754ec
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B7/02

Abstract:
An optical arrangement, for example a lithography system, includes: a first component, in particular a carrying frame; a second component, in particular a mirror, which is movable in relation to the first component; and at least one stop with at least one stop face for limiting the movement of the second component in relation to the first component. The optical arrangement, preferably the stop, can have a fixing device for fixing the second component. The fixing device can have a fixing element that is movable in relation to the stop face of the stop. Further aspects of the device likewise relate to an optical arrangement with a fixing device or with a transport lock.
Public/Granted literature
- US20190339625A1 OPTICAL ARRANGEMENT, IN PARTICULAR LITHOGRAPHY SYSTEM, WITH A TRANSPORT LOCK Public/Granted day:2019-11-07
Information query
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