Invention Grant
- Patent Title: Substrate holding apparatus, exposure apparatus, and article manufacturing method
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Application No.: US16422760Application Date: 2019-05-24
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Publication No.: US10761434B2Publication Date: 2020-09-01
- Inventor: Shunya Sakata , Akihiro Takahashi , Noboru Osaka
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1daac8a6 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3cac80c8
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/687 ; H01L21/027
Abstract:
There is provided a substrate holding apparatus including a base provided with a gap and a reflection member disposed in the gap and configured to reflect light that has transmitted the substrate to the substrate side, and an exposure apparatus including the substrate holding apparatus.
Public/Granted literature
- US20190369506A1 SUBSTRATE HOLDING APPARATUS, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD Public/Granted day:2019-12-05
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