- Patent Title: Processing fluid supply device, substrate processing device, processing fluid supply method, substrate processing method, processing fluid processing device, and processing fluid processing method
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Application No.: US16008710Application Date: 2018-06-14
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Publication No.: US10761422B2Publication Date: 2020-09-01
- Inventor: Masahiro Miyagi , Hiroyuki Araki , Masanori Suzuki , Tomokatsu Sato , Nobuo Kawase
- Applicant: SCREEN Holdings Co., Ltd.
- Applicant Address: JP
- Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@67127a74 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7bc33458 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@40e4475 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@620750c
- Main IPC: G21K5/08
- IPC: G21K5/08 ; G03F1/82 ; G21K5/10 ; H01L51/00
Abstract:
A processing liquid supplying apparatus is arranged to discharge a processing liquid from a discharge port to supply the processing liquid to a processing object, and the processing liquid supplying apparatus includes a first piping, through the interior of which the processing liquid can flow, the interior of the first piping being in communication with the discharge port, and an X-ray irradiating means irradiating X-rays onto the processing liquid present inside the first piping. The first piping has an opening in its pipe wall and the opening is closed by a window member formed using a material that can transmit the X-rays, and the X-ray irradiating means irradiates the X-rays onto the processing liquid present inside the first piping via the window member.
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