Invention Grant
- Patent Title: System and method for optimally forming gratings of diffracted optical elements
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Application No.: US16035506Application Date: 2018-07-13
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Publication No.: US10761334B2Publication Date: 2020-09-01
- Inventor: Morgan Evans , Rutger Meyer Timmerman Thijssen , Joseph Olson , Peter Kurunczi
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: G02B5/18
- IPC: G02B5/18 ; G02B27/09 ; G02B27/01

Abstract:
Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an etch stop layer atop a substrate, and providing an optical grating layer atop the etch stop layer. The method may further include providing a patterned mask layer over the optical grating layer, and etching the optical grating layer and the patterned mask layer to form an optical grating in the optical grating layer. The optical grating may include a plurality of angled components, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate, wherein the etching forms an area of over-etch in the etch stop layer between the plurality of angled components.
Public/Granted literature
- US20200018981A1 SYSTEM AND METHOD FOR OPTIMALLY FORMING GRATINGS OF DIFFRACTED OPTICAL ELEMENTS Public/Granted day:2020-01-16
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