Method for protecting a MEMS unit against infrared investigations and MEMS unit
Abstract:
A method is provided for protecting a MEMS unit against infrared investigations, at least one layer being built into the structure of the MEMS unit or at least one layer being applied on a surface of the MEMS unit. The at least one layer absorbs, reflects or diffusely scatters more than 50%, in particular more than 90% of an infrared light incident upon it.
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