A method of making a semiconductor device includes patterning a photoresist on a substrate to form a plurality of openings in the photoresist. A first opening is near a center of the substrate and has a first width. A second opening is near an edge of the substrate and has a second width smaller than the first width. A third opening is between the first opening and the second opening and has a third width greater than the second width and smaller than the first width. The method further includes plating a conductive material into each opening. Plating the conductive material includes plating the first conductive material in the first opening at a first current density; plating the first conductive material in the second opening at a second current density greater than the first current density; and plating the conductive material in the third opening at a third current density.