Invention Grant
- Patent Title: Method for manufacturing graphene and apparatus for manufacturing graphene
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Application No.: US15910301Application Date: 2018-03-02
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Publication No.: US10738377B2Publication Date: 2020-08-11
- Inventor: Takashi Matsumoto
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7d76d0fa
- Main IPC: B05D3/06
- IPC: B05D3/06 ; C23C14/22 ; C23C16/26 ; C23C16/452 ; C23C16/48 ; C23C14/02 ; C23C18/14 ; C23C14/58 ; C23C14/06
Abstract:
There is provided a method for manufacturing graphene. The method includes an adsorption step of causing six-membered ring structures of carbon atoms to be adsorbed to a surface of a substrate; and an irradiation step of irradiating the surface of the substrate with a beam of a molecule containing carbon atoms.
Public/Granted literature
- US20180187298A1 Method for Manufacturing Graphene and Apparatus for Manufacturing Graphene Public/Granted day:2018-07-05
Information query
