Invention Grant
- Patent Title: RF switches, integrated circuits, and devices with multi-gate field effect transistors and voltage leveling circuits, and methods of their fabrication
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Application No.: US16398811Application Date: 2019-04-30
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Publication No.: US10734516B2Publication Date: 2020-08-04
- Inventor: Venkata Naga Koushik Malladi
- Applicant: NXP USA, Inc.
- Applicant Address: US TX Austin
- Assignee: NXP USA, Inc.
- Current Assignee: NXP USA, Inc.
- Current Assignee Address: US TX Austin
- Agent Sherry W. Schumm
- Main IPC: H01L21/8234
- IPC: H01L21/8234 ; H01L29/78 ; H04B1/48 ; H01L27/07 ; H01L29/66 ; H01L27/02 ; H01L23/66 ; H01L27/06 ; H01L49/02 ; H03K17/22 ; H01L29/786 ; H04B1/44

Abstract:
Embodiments of field effect transistor (FET) circuits, RF switches, and devices include source and drain terminals coupled to an active surface of a semiconductor substrate, a channel in the substrate between the source and drain terminals, and a plurality of gate structures coupled to the active surface over the channel. A channel contact is coupled to the active surface over the channel between a first pair of the gate structures, and a first capacitor is electrically coupled between the channel contact and a gate structure of the plurality of gate structures.
Public/Granted literature
Information query
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