Invention Grant
- Patent Title: Semiconductor devices having an electro-static discharge protection structure
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Application No.: US14609498Application Date: 2015-01-30
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Publication No.: US10734330B2Publication Date: 2020-08-04
- Inventor: Yi-Feng Chang
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: Jones Day
- Main IPC: H01L23/60
- IPC: H01L23/60 ; H01L23/482 ; H01L23/522

Abstract:
A semiconductor device includes a substrate and a metallization layer. The substrate has an active region that includes opposite first and second edges. The metallization layer is disposed above the substrate, and includes a pair of metal lines and a metal plate. The metal lines extend from an outer periphery of the active region into the active region and toward the second edge of the active region. The metal plate interconnects the metal lines and at least a portion of which is disposed at the outer periphery of the active region.
Public/Granted literature
- US20160225726A1 SEMICONDUCTOR DEVICES HAVING AN ELECTRO-STATIC DISCHARGE PROTECTION STRUCTURE Public/Granted day:2016-08-04
Information query
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