Invention Grant
- Patent Title: Systems and methods for a tunable electromagnetic field apparatus to improve doping uniformity
-
Application No.: US16234793Application Date: 2018-12-28
-
Publication No.: US10734231B2Publication Date: 2020-08-04
- Inventor: Chien-An Lai , Joseph Wu , Wen-Yu Ku
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/26
- IPC: H01L21/26 ; H01L21/42 ; H01L21/223 ; H01J37/32
Abstract:
A method includes receiving a semiconductor wafer into a chamber; generating a plasma within the chamber to accelerate particles toward the semiconductor wafer; generating a magnetic field above the semiconductor wafer by an electromagnetic structure contained within the chamber, wherein the electromagnetic structure comprises a plurality of electromagnetic elements; and adjusting the magnetic field, wherein the adjusting of the magnetic field includes moving positions of each of the plurality of electromagnetic elements independently.
Public/Granted literature
- US20190139770A1 Systems and Methods for a Tunable Electromagnetic Field Apparatus to Improve Doping Uniformity Public/Granted day:2019-05-09
Information query
IPC分类:
