Invention Grant
- Patent Title: Light source and a manufacturing method therewith
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Application No.: US16225620Application Date: 2018-12-19
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Publication No.: US10707419B2Publication Date: 2020-07-07
- Inventor: Chien-Yu Chen
- Applicant: INT TECH CO., LTD.
- Applicant Address: TW Hsinchu County
- Assignee: INT TECH CO., LTD.
- Current Assignee: INT TECH CO., LTD.
- Current Assignee Address: TW Hsinchu County
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/56 ; H01L27/32 ; H01L51/52

Abstract:
A method of forming a device includes emitting a coherent light beam and providing a mask including a region transparent to the light beam. The method further includes projecting the light beam on a photosensitive layer through the transparent region of the mask. The method further includes forming a recess in the photosensitive layer, wherein the recess corresponds to a position of the transparent region of the mask. The method further includes filling an organic light emitting material in the recess.
Public/Granted literature
- US20190123281A1 LIGHT SOURCE AND A MANUFACTURING METHOD THEREWITH Public/Granted day:2019-04-25
Information query
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