Invention Grant
- Patent Title: Thin film transistor, method of manufacturing thin film transistor, and display
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Application No.: US15512163Application Date: 2015-09-10
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Publication No.: US10707313B2Publication Date: 2020-07-07
- Inventor: Koichi Amari
- Applicant: SONY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Chip Law Group
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4b869bd5
- International Application: PCT/JP2015/075703 WO 20150910
- International Announcement: WO2016/052127 WO 20160407
- Main IPC: H01L29/417
- IPC: H01L29/417 ; H01L27/12 ; H01L27/28 ; H01L29/66 ; H01L29/786 ; H01L51/05

Abstract:
A thin film transistor includes a gate electrode, an insulation film disposed on the gate electrode, a semiconductor layer facing the gate electrode with the insulation film in between, and a source-drain wiring layer electrically coupled to the semiconductor layer, and including a first wiring layer and a second wiring layer. The first wiring layer is in contact with the semiconductor layer between the semiconductor layer and the insulation film, and is configured of a transparent electroconductive film. The second wiring layer is overlapped with a portion of the first wiring layer. Another semiconductor layer made of a material same as a material of the semiconductor layer is stacked on the second wiring layer.
Public/Granted literature
- US20170288029A1 THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THIN FILM TRANSISTOR, AND DISPLAY Public/Granted day:2017-10-05
Information query
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