Invention Grant
- Patent Title: GaN laminate and method of manufacturing the same
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Application No.: US16284473Application Date: 2019-02-25
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Publication No.: US10707309B2Publication Date: 2020-07-07
- Inventor: Hajime Fujikura
- Applicant: SCIOCS COMPANY LIMITED , SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Ibaraki JP Tokyo
- Assignee: SCIOCS COMPANY LIMITED,SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SCIOCS COMPANY LIMITED,SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Ibaraki JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@71d155a7
- Main IPC: H01L29/20
- IPC: H01L29/20 ; H01L21/02 ; H01L29/04 ; H01L21/20 ; H01L29/22 ; H01L33/00

Abstract:
To provide a new GaN laminate obtained b growing a GaN layer on a GaN substrate by HVPE, including: a GaN substrate containing GaN single crystal and having a low index crystal plane as c-plane closest to a main surface; and a GaN layer epitaxially grown on the main surface of the GaN substrate wherein a surface of the GaN layer has a macro step-macro terrace structure in which a macro step and a macro terrace are alternately arranged, one of the macro step and the macro terrace has a step-terrace structure in which a step having a height of equal to or more than a plurality of molecular layers of GaN and extending in a direction orthogonal to m-axis direction, and a terrace are alternately arranged, and the other one of the macro step and the macro terrace has a step-terrace structure in which a step having a height of equal to or more than a plurality of molecular layers of GaN and extending in a direction orthogonal to a-axis direction, and a terrace are alternately arranged.
Public/Granted literature
- US20190273138A1 GaN LAMINATE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2019-09-05
Information query
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