Invention Grant
- Patent Title: Memory device and fabrication method thereof
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Application No.: US16132592Application Date: 2018-09-17
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Publication No.: US10707295B2Publication Date: 2020-07-07
- Inventor: An-Hao Cheng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L29/66 ; H01L21/8234 ; H01L21/768 ; H01L29/423 ; H01L21/762 ; H01L27/108

Abstract:
A semiconductor device includes a semiconductor substrate, a capacitor structure, a first contact plug, and a spacer. The capacitor structure is over the semiconductor substrate. The capacitor structure includes a bottom electrode, a capacitor dielectric, and a top electrode. The bottom electrode is over the semiconductor substrate. The capacitor dielectric is over a first portion of the bottom electrode. The top electrode is over the capacitor dielectric. The first contact plug is on and connected to a second portion of the bottom electrode. The spacer is on at least a sidewall of the second portion of the bottom electrode.
Public/Granted literature
- US20200091276A1 MEMORY DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2020-03-19
Information query
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