Invention Grant
- Patent Title: Solid state imaging device and method for manufacturing same
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Application No.: US15940822Application Date: 2018-03-29
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Publication No.: US10707246B2Publication Date: 2020-07-07
- Inventor: Hiroki Takahashi , Hiroshi Tanaka
- Applicant: TowerJazz Panasonic Semiconductor Co., Ltd.
- Applicant Address: JP Uozu, Toyama
- Assignee: TowerJazz Panasonic Semiconductor Co., Ltd.
- Current Assignee: TowerJazz Panasonic Semiconductor Co., Ltd.
- Current Assignee Address: JP Uozu, Toyama
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H04N5/369

Abstract:
In a solid state imaging device having a plurality of pixels arranged in a matrix on a substrate, each of the plurality of pixels includes a photoelectric conversion region and an element separation region separating the photoelectric conversion region. The substrate includes a semiconductor substrate, a first epitaxial layer formed on the semiconductor substrate, and a second epitaxial layer formed on the first epitaxial layer. The photoelectric conversion region and the element separation region are formed over the first epitaxial layer and the second epitaxial layer.
Public/Granted literature
- US20180219036A1 SOLID STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2018-08-02
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