Invention Grant
- Patent Title: Orthogonal patterning method
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Application No.: US15503970Application Date: 2015-08-13
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Publication No.: US10707079B2Publication Date: 2020-07-07
- Inventor: Myung Han Yoon , Su Jin Sung
- Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Gwangju
- Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Gwangju
- Agency: Hauptman Ham, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@445bd89b
- International Application: PCT/KR2015/008484 WO 20150813
- International Announcement: WO2016/024823 WO 20160218
- Main IPC: H01L21/027
- IPC: H01L21/027 ; H01L27/12 ; H01L51/00 ; H01L21/02 ; H01L21/311 ; H01L51/56 ; H01L27/32
Abstract:
The present invention relates to a method for forming a layer, to be patterned, of an element by using a fluorinated material, which has orthogonality, and a solvent, the method comprising: a first step of printing with the fluorinated material so as to form, on a surface of a substrate, a mask template provided with an exposure part and a non-exposure part; a second step of coating the exposure part with a material to be patterned; a the third step of lifting-off the non-exposure part with the fluorinated solvent so as to form the layer to be patterned in the exposure part.
Public/Granted literature
- US20170236706A1 ORTHOGONAL PATTERNING METHOD Public/Granted day:2017-08-17
Information query
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