- Patent Title: Organic processing liquid for patterning chemical amplification resist film, container for organic processing liquid for patterning chemical amplification resist film, and pattern forming method, method of manufacturing electronic device, and electronic device using the same
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Application No.: US14697942Application Date: 2015-04-28
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Publication No.: US10705428B2Publication Date: 2020-07-07
- Inventor: Tsukasa Yamanaka , Takashi Kawamoto
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1933101b com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@31c94b4e
- Main IPC: G03F7/32
- IPC: G03F7/32 ; B65D25/14 ; B65D85/00 ; G03F7/20 ; G03F7/039 ; G03F7/038
Abstract:
According to an exemplary embodiment of the present invention, there are provided an organic treatment solution for patterning chemically amplified resist films, an organic treatment solution containing 1 ppm or less of an alkyl olefin having a carbon number of 22 or less and having a metal element concentration of 5 ppm or less for each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn, a pattern formation method, an electronic device manufacturing method, and an electronic device use the same.
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