Invention Grant
- Patent Title: Double MTJ stack with synthetic anti-ferromagnetic free layer and AlN bottom barrier layer
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Application No.: US16277365Application Date: 2019-02-15
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Publication No.: US10692927B1Publication Date: 2020-06-23
- Inventor: Matthias G. Gottwald
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Daniel P. Morris, Esq.
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/10 ; G11C11/16 ; H01L43/02 ; H01L43/08

Abstract:
A double magnetic tunnel junction (MTJ) stack for use in spin-transfer torque magnetoresistive random access memory (STT MRAM) is provided. The double MTJ stack includes a bottom tunnel barrier layer having hexagonal symmetry and composed of AlN, a magnetic free layer stack containing a synthetic anti-ferromagnetic coupling layer, and a top tunnel barrier layer having cubic symmetry. For such a double MTJ stack, the symmetry requirements for the tunnel barrier layers do not conflict anymore with the symmetry requirements for strong anti-ferromagnetic exchange. Thus, such a double MTJ stack can be used to provide performance enhancement such as faster switching times and lower write errors to a STT MRAM.
Information query
IPC分类: