Invention Grant
- Patent Title: Alignment marks in substrate having through-substrate via (TSV)
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Application No.: US16227752Application Date: 2018-12-20
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Publication No.: US10692764B2Publication Date: 2020-06-23
- Inventor: Hsin Chang , Fang Wen Tsai , Jing-Cheng Lin , Wen-Chih Chiou , Shin-Puu Jeng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/768 ; H01L23/544 ; H01L23/00 ; H01L21/683 ; H01L23/498

Abstract:
A device includes a substrate, and an alignment mark including a conductive through-substrate via (TSV) penetrating through the substrate.
Public/Granted literature
- US20190131172A1 Alignment Marks in Substrate Having Through-Substrate Via (TSV) Public/Granted day:2019-05-02
Information query
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