Invention Grant
- Patent Title: Substrate measurement recipe configuration to improve device matching
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Application No.: US16305913Application Date: 2017-06-01
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Publication No.: US10691029B2Publication Date: 2020-06-23
- Inventor: Ning Gu , Daimian Wang , Jen-Shiang Wang
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2017/063383 WO 20170601
- International Announcement: WO2017/215944 WO 20171221
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G06F30/30 ; G03F7/20

Abstract:
A method including computing a multi-variable cost function, the multi-variable cost function representing a metric characterizing a degree of matching between a result when measuring a metrology target structure using a substrate measurement recipe and a behavior of a pattern of a functional device, the metric being a function of a plurality of design variables including a parameter of the metrology target structure, and adjusting the design variables and computing the cost function with the adjusted design variables, until a certain termination condition is satisfied.
Public/Granted literature
- US20190250519A1 SUBSTRATE MEASUREMENT RECIPE CONFIGURATION TO IMPROVE DEVICE MATCHING Public/Granted day:2019-08-15
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