Invention Grant
- Patent Title: Transition metal doped germanium-antimony-tellurium (GST) memory device components and composition
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Application No.: US16529573Application Date: 2019-08-01
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Publication No.: US10686131B2Publication Date: 2020-06-16
- Inventor: Paolo Fantini , Marco Bernasconi , Silvia Gabardi
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Holland & Hart LLP
- Main IPC: H01L45/00
- IPC: H01L45/00 ; G11C13/00 ; G11C8/14 ; G11C7/18

Abstract:
Methods, systems, and devices for operating memory cell(s) using transition metal doped GST are described. As discussed herein, a composition including germanium (Ge), antimony (Sb), tellurium (Te), and at least one of yttrium (Y) and scandium (Sc) may be used as a memory element in a memory cell. For example, a memory element may include a composition having Ge in an amount ranging from 15 to 35 atomic percent (at. %) of the composition, Sb in an amount less than or equal to 50 at. % of the composition, Te in an amount greater than or equal to 40 at. % of the composition, and at least one of Y and Sc in an amount ranging from 0.15 to 10 at. % of the composition.
Public/Granted literature
- US20200066986A1 TRANSITION METAL DOPED GERMANIUM-ANTIMONY-TELLURIUM (GST) MEMORY DEVICE COMPONENTS AND COMPOSITION Public/Granted day:2020-02-27
Information query
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