Invention Grant
- Patent Title: Via contact resistance control
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Application No.: US16291105Application Date: 2019-03-04
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Publication No.: US10685915B2Publication Date: 2020-06-16
- Inventor: Chih-Chao Yang , Theodorus E Standaert
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Jeffrey S. LaBaw; Steven J Meyers; Alvin Borromeo
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/528 ; H01L21/768 ; H01L23/522 ; H01L21/3213 ; H01L21/311 ; H01L23/532

Abstract:
A first dielectric layer on a substrate is provided. The first dielectric layer has a first level metal line embedded in the dielectric. An opposite gouging feature is in a top surface of the first level metal line. The opposite gouging feature has a protuberant shape relative to the first level metal line. A second dielectric layer is over the first dielectric layer. A compound recess is in the second dielectric layer. A first portion of the recess is for a via connector positioned over the opposite gouging feature.
Public/Granted literature
- US20190341298A1 VIA CONTACT RESISTANCE CONTROL Public/Granted day:2019-11-07
Information query
IPC分类: