Invention Grant
- Patent Title: Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition
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Application No.: US16036113Application Date: 2018-07-16
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Publication No.: US10685844B2Publication Date: 2020-06-16
- Inventor: Sangwon Kim , Changsik Song , Dongcheol Jeong , Minsu Seol , Hyeonjin Shin , Dongwook Lee , Taewoo Kim , Juhyen Lee , Hyejin Cho
- Applicant: Samsung Electronics Co., Ltd. , Research & Business Foundation SUNGKYUNKWAN UNIVERSITY
- Applicant Address: KR Gyeonggi-do KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.,Research & Business Foundation, Sungkyunkwan University
- Current Assignee: Samsung Electronics Co., Ltd.,Research & Business Foundation, Sungkyunkwan University
- Current Assignee Address: KR Gyeonggi-do KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@fab9954
- Main IPC: H01L21/308
- IPC: H01L21/308 ; H01L29/16 ; C07B37/12 ; G03F7/004 ; H01L21/311 ; G03F7/16 ; G03F7/027 ; H01L21/033 ; G03F7/09 ; C08L101/02 ; B82Y30/00 ; C07C15/20 ; C07C39/14 ; C07C63/337 ; H01L29/66
Abstract:
Provided are a hardmask composition, a method of forming a pattern using the hardmask composition, and a hardmask formed using the hardmask composition. The hardmask composition includes a polar nonaqueous organic solvent and one of: i) a mixture of graphene quantum dots and at least one selected from a diene and a dienophile, ii) a Diels-Alder reaction product of the graphene quantum dots and the at least one selected from a diene and a dienophile, iii) a thermal treatment product of the Diels-Alder reaction product of graphene quantum dots and the at least one selected from a diene and a dienophile, or iv) a combination thereof.
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