Invention Grant
- Patent Title: Nonvolatile semiconductor memory with gate insulation layer of a transistor including ferroelectric material
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Application No.: US16120031Application Date: 2018-08-31
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Publication No.: US10685709B2Publication Date: 2020-06-16
- Inventor: Chika Tanaka , Masumi Saitoh
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@16ea9aab
- Main IPC: G11C11/21
- IPC: G11C11/21 ; G11C14/00 ; H01L27/11502

Abstract:
A semiconductor memory includes a first and a second transistor each with one of source/drain connected to a first wiring. The other of the source/drain for each of first and second transistor is connected to the gate of the other transistor. A third and a fourth transistor each have gates connected to a second wiring, one of source/drain of each connected to a third or fifth wiring, the other of the source/drain connected to the other of the source/drain of the first or second transistor. For the third transistor, a gate insulation layer includes a first ferroelectric material. For the fourth transistor, and a gate insulation layer includes a second ferroelectric material.
Public/Granted literature
- US20190287617A1 NONVOLATILE SEMICONDUCTOR MEMORY Public/Granted day:2019-09-19
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