Invention Grant
- Patent Title: Pressure control device and pressure control system
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Application No.: US16128843Application Date: 2018-09-12
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Publication No.: US10684632B2Publication Date: 2020-06-16
- Inventor: Takahiro Nozawa , Yoshitomo Kanai , Takeshi Nakamura
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Cantor Colburn LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@43d770b2
- Main IPC: G05D16/20
- IPC: G05D16/20 ; G05D7/06 ; H01L21/67

Abstract:
A pressure control device controls a flow rate of gas supplied to a pressure control target to maintain an inside of the pressure control target at set pressure. The pressure control device includes a controller that is configured to: subtract, at a predetermined ratio, a signal related to the supply of gas from a set pressure signal indicating the set pressure, when gas is being supplied into the pressure control target in order to bring the inside of the pressure control target to the set pressure; compare a detected pressure signal indicating pressure within the pressure control target with the set pressure signal subjected to the subtraction; and control, on the basis of a comparison result obtained by the controller, a flow rate control valve which controls a flow rate of gas supplied to the pressure control target.
Public/Granted literature
- US20190018434A1 PRESSURE CONTROL DEVICE AND PRESSURE CONTROL SYSTEM Public/Granted day:2019-01-17
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