Invention Grant
- Patent Title: Illumination system and projection apparatus
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Application No.: US16246552Application Date: 2019-01-14
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Publication No.: US10684540B2Publication Date: 2020-06-16
- Inventor: Haw-Woei Pan , Chi-Tang Hsieh
- Applicant: Coretronic Corporation
- Applicant Address: TW Hsin-Chu
- Assignee: Coretronic Corporation
- Current Assignee: Coretronic Corporation
- Current Assignee Address: TW Hsin-Chu
- Agency: JCIPRNET
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@786582bb
- Main IPC: G03B21/20
- IPC: G03B21/20 ; G03B21/00 ; G02B27/10 ; G03B33/00

Abstract:
An illumination system including a first excitation light source, a wavelength conversion element, and a scattering element is provided. The first excitation light source emits a first excitation beam. The wavelength conversion element includes a wavelength conversion material. The wavelength conversion element has a first region and a second region. A concentration of the wavelength conversion material in the first region is greater than a concentration of the wavelength conversion material in the second region. The scattering element is disposed on a transmission path of the first excitation beam. A projection apparatus with the illumination system is also provided.
Public/Granted literature
- US20190227416A1 ILLUMINATION SYSTEM AND PROJECTION APPARATUS Public/Granted day:2019-07-25
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