Invention Grant
- Patent Title: Method for manufacturing laminate
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Application No.: US16066167Application Date: 2016-12-27
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Publication No.: US10682669B2Publication Date: 2020-06-16
- Inventor: Kohei Masuda , Masaki Tanaka , Takashi Yoda , Tatsuya Ekinaka
- Applicant: Shin-Etsu Chemical Co., Ltd. , TEIJIN LIMITED
- Applicant Address: JP Tokyo JP Osaka
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.,TEIJIN LIMITED
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.,TEIJIN LIMITED
- Current Assignee Address: JP Tokyo JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@39736a0a
- International Application: PCT/JP2016/088985 WO 20161227
- International Announcement: WO2017/115819 WO 20170706
- Main IPC: B05D1/38
- IPC: B05D1/38 ; B05D3/04 ; B05D7/24 ; B32B27/00 ; B32B27/18 ; B32B27/30 ; C08J7/04 ; C08J7/12 ; B05D1/00 ; B05D3/14 ; C23C16/30 ; C08K3/22 ; B05D1/18 ; B05D5/06 ; B05D7/00 ; B32B7/12 ; B32B27/24 ; B32B27/36

Abstract:
The present invention provides a method for manufacturing a laminate that exhibits visible light transparency and ultraviolet light shielding properties while maintaining an extremely high degree of scratch resistance, and that has all the necessary weather resistance and durability properties for withstanding long-term outdoor exposure. This method for manufacturing a laminate having the abovementioned properties includes: (1) using active energy rays to cure, on an organic resin substrate, an acrylic silicone resin composition having an inorganic component percentage X of 0.2 to 0.8 to form an intermediate layer, (2) dry-etching the surface of the intermediate layer obtained at step (1) using a non-oxidizing gas plasma of a plasma irradiation amount Y correlated with the inorganic component percentage X; and (3) plasma-polymerizing an organosilicon compound to form a hard coat layer on the surface of the intermediate layer obtained at step (2).
Public/Granted literature
- US20190015868A1 METHOD FOR MANUFACTURING LAMINATE Public/Granted day:2019-01-17
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