Invention Grant
- Patent Title: Method for manufacturing light emitting device
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Application No.: US16115489Application Date: 2018-08-28
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Publication No.: US10672945B2Publication Date: 2020-06-02
- Inventor: Hirofumi Kawaguchi
- Applicant: NICHIA CORPORATION
- Applicant Address: JP Anan-Shi
- Assignee: NICHIA CORPORATION
- Current Assignee: NICHIA CORPORATION
- Current Assignee Address: JP Anan-Shi
- Agency: Foley & Lardner LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6de527da
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/38 ; H01L33/62 ; H01L33/42 ; H01L21/786 ; H01L33/40 ; H01L33/32

Abstract:
A method of manufacturing a light emitting device includes: a first wafer preparation step including preparing, on a first substrate, m first wafers (where m≥2), each of the first wafers comprising a first semiconductor layer, an active layer, and a second semiconductor layer; a second wafer preparation step including bonding a second substrate with the second semiconductor layer of a first of the m first wafers and then removing the first substrate from the first wafer, so as to form a second wafer in which the first semiconductor layer is exposed; and a first bonding step including bonding the first semiconductor layer exposed at the surface of the second wafer and the second semiconductor layer of a second of the m first wafers together using a light-transmissive conductive layer, and then removing a first substrate of the second of the m first wafers.
Public/Granted literature
- US20190074402A1 METHOD FOR MANUFACTURING LIGHT EMITTING DEVICE Public/Granted day:2019-03-07
Information query
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