Invention Grant
- Patent Title: High-resistivity single crystal zinc oxide wafer based radiation detector and preparation method and use thereof
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Application No.: US16212568Application Date: 2018-12-06
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Publication No.: US10672940B2Publication Date: 2020-06-02
- Inventor: Feng Huang , Xu Ji , Mei Dong , Kun Yan
- Applicant: SUN YAT-SEN UNIVERSITY
- Applicant Address: CN Guangdong
- Assignee: SUN YAT-SEN UNIVERSITY
- Current Assignee: SUN YAT-SEN UNIVERSITY
- Current Assignee Address: CN Guangdong
- Agency: JCIPRNET
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@78044a6e com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2148ccce
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/18 ; C30B29/16 ; C30B33/04 ; H01L31/02 ; H01L31/08 ; H01L31/0224 ; H01L31/0296

Abstract:
The present invention discloses a high-resistivity single crystal zinc oxide (ZnO) wafer and a high-resistivity single crystal ZnO-based radiation detector, and preparation method and use thereof. The preparation method of the high-resistivity single crystal zinc oxide wafer is to place a single crystal ZnO wafer in a metal lithium electrochemical device for a constant-current discharge treatment, and then to place the single crystal ZnO wafer in a high-pressure oxygen atmosphere at 800 to 1000° C. and 10 to 30 atm for an annealing treatment for 20 to 28 hours. The preparation method of the radiation detector is to evaporate a metal electrode layer at both sides of the high-resistivity single crystal ZnO wafer, then to bond the wafer onto a circuit board, and to connect the wafer with the circuit board by a gold thread.
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