Invention Grant
- Patent Title: Power semiconductor device having different channel regions
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Application No.: US16507152Application Date: 2019-07-10
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Publication No.: US10672767B2Publication Date: 2020-06-02
- Inventor: Anton Mauder , Franz-Josef Niedernostheide , Christian Philipp Sandow
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1b41cbf7
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L29/10 ; H01L29/423 ; H03K17/687 ; H01L29/739 ; H01L29/78 ; H01L29/06 ; H01L29/40 ; H01L29/49

Abstract:
A power semiconductor device includes a semiconductor body coupled to first and second load terminal structures, and first and second cells each configured for controlling a load current and electrically connected to the first load terminal structure and to a drift region. A first mesa in the first cell includes a port region electrically connected to the first load terminal structure, and a first channel region coupled to the drift region. A second mesa included in the second cell includes a port region electrically connected to the first load terminal structure, and a second channel region coupled to the drift region. The mesas are spatially confined in a direction perpendicular to a direction of the load current by an insulation structure, and have a total extension of less than 100 nm in that direction. The first channel region includes an inversion channel. The second channel region includes an accumulation channel.
Public/Granted literature
- US20190371794A1 Power Semiconductor Device Having Different Channel Regions Public/Granted day:2019-12-05
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