Invention Grant
- Patent Title: Compact vertical inductors extending in vertical planes
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Application No.: US16372765Application Date: 2019-04-02
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Publication No.: US10665380B2Publication Date: 2020-05-26
- Inventor: Hsiao-Tsung Yen , Huan-Neng Chen , Yu-Ling Lin , Chin-Wei Kuo , Mei-Show Chen , Ho-Hsiang Chen , Min-Chie Jeng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01F27/28
- IPC: H01F27/28 ; H01F17/00 ; H01L23/522

Abstract:
A device includes a substrate, and a vertical inductor over the substrate. The vertical inductor includes a plurality of parts formed of metal, wherein each of the parts extends in one of a plurality of planes perpendicular to a major surface of the substrate. Metal lines interconnect neighboring ones of the plurality of parts of the vertical inductor.
Public/Granted literature
- US20190228898A1 Compact Vertical Inductors Extending in Vertical Planes Public/Granted day:2019-07-25
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