Invention Grant
- Patent Title: Flash memory cell structure with step-shaped floating gate
-
Application No.: US16191085Application Date: 2018-11-14
-
Publication No.: US10658479B2Publication Date: 2020-05-19
- Inventor: Yu-Hsien Chu , Chiang-Ming Chuang , Cheng-Huan Chung
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L27/11521 ; H01L21/321 ; H01L29/66 ; H01L21/3213 ; H01L21/28 ; H01L29/788 ; H01L27/11534 ; H01L27/11524

Abstract:
The present disclosure relates to a flash memory cell that includes a substrate and a floating gate structure over the substrate. The floating gate structure includes a first portion having a first top surface and a first thickness. The floating gate structure also includes a second portion having a second top surface and a second thickness that is different from the first thickness. The floating gate structure further includes a sidewall surface connecting the first and second top surfaces, and an angle between the first top surface and the sidewall surface of the floating gate structure is an obtuse angle. The flash memory cell also includes a control gate structure over the first and second portions of the floating gate structure.
Public/Granted literature
- US20190148504A1 FLASH MEMORY CELL STRUCTURE WITH STEP-SHAPED FLOATING GATE Public/Granted day:2019-05-16
Information query
IPC分类: