Invention Grant
- Patent Title: Semiconductor device with an insulated-gate bipolar transistor region and a diode region
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Application No.: US15791760Application Date: 2017-10-24
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Publication No.: US10658360B2Publication Date: 2020-05-19
- Inventor: Souichi Yoshida , Masaki Tamura , Kenji Kouno , Hiromitsu Tanabe
- Applicant: FUJI ELECTRIC CO., LTD. , DENSO CORPORATION
- Applicant Address: JP Kawasaki-Shi, Kanagawa JP Kariya, Aichi
- Assignee: FUJI ELECTRIC CO., LTD.,DENSO CORPORATION
- Current Assignee: FUJI ELECTRIC CO., LTD.,DENSO CORPORATION
- Current Assignee Address: JP Kawasaki-Shi, Kanagawa JP Kariya, Aichi
- Agency: Rabin & Berdo, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6e7f8d4f
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/07 ; H01L29/32 ; H01L29/861 ; H01L29/08 ; H01L21/8249 ; H01L29/739 ; H01L29/40 ; H01L49/02 ; H01L29/06

Abstract:
On a front surface side of an n− semiconductor substrate, an emitter electrode and trench gates each including a p base layer, a trench, a gate oxide film and a gate electrode are provided in an IGBT region and a FWD region. Among p base layers each between adjacent trenches, p base layers having an n+ emitter region are the IGBT emitter region and the p base layers not having the n+ emitter region are the FWD anode region. A lateral width of an n+ cathode region is narrower than a lateral width of the FWD anode region. A difference of a lateral width of the FWD anode region and a lateral width of the n+ cathode region is 50 μm or more. Thus, a semiconductor device may be provided that reduces the forward voltage drop while suppressing waveform oscillation during reverse recovery and having soft recover characteristics.
Public/Granted literature
- US20180047725A1 SEMICONDUCTOR DEVICE Public/Granted day:2018-02-15
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