Invention Grant
- Patent Title: Apparatus for prevention of backside deposition in a spatial ALD process chamber
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Application No.: US15494840Application Date: 2017-04-24
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Publication No.: US10658223B2Publication Date: 2020-05-19
- Inventor: Joseph Yudovsky , Alexander S. Polyak
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/683
- IPC: H01L21/683 ; C23C16/458 ; C23C16/44 ; C23C16/455 ; H01L21/687
Abstract:
Susceptor assemblies comprising a susceptor with a support post are described. The susceptor has a body with a top surface and a bottom surface. The top surface has a plurality of recesses therein. The support post is connected to the bottom surface of the susceptor to rotate the susceptor assembly. The support post includes support post vacuum plenum in fluid communication with a susceptor vacuum plenum in the body of the susceptor. The support post also includes a purge gas line extending through the support post to a purge gas plenum in the body of the susceptor.
Public/Granted literature
- US20170309512A1 Apparatus For Prevention Of Backside Deposition In A Spatial ALD Process Chamber Public/Granted day:2017-10-26
Information query
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