Invention Grant
- Patent Title: Method for producing R-T-B based sintered magnet
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Application No.: US14915801Application Date: 2014-09-01
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Publication No.: US10658108B2Publication Date: 2020-05-19
- Inventor: Ryouichi Yamagata , Rintaro Ishii , Futoshi Kuniyoshi , Teppei Satoh
- Applicant: HITACHI METALS, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI METALS, LTD.
- Current Assignee: HITACHI METALS, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6d54800e com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@53109f61
- International Application: PCT/JP2014/072920 WO 20140901
- International Announcement: WO2015/030231 WO 20150305
- Main IPC: H01F41/02
- IPC: H01F41/02 ; B22F3/24 ; C22C38/00 ; C22C33/02 ; C21D6/00 ; H01F1/057 ; C22C38/06 ; C22C38/10 ; C22C38/12 ; C22C38/14 ; C22C38/16

Abstract:
Disclosed is a method for producing a magnet, including a step of preparing a magnet represented by the formula: uRwBxGayCuzAlqM(balance)T, where RH is 5% or less, 0.20≤x≤0.70, 0.07≤y≤0.2, 0.05≤z≤0.5, 0≤q≤0.1; when 0.40≤x≤0.70, v and w satisfy the following inequality expressions: 50w−18.5≤v≤50w−14, and −12.5w+38.75≤v≤−62.5w+86.125; and, when 0.20≤x≤0.40, v and w satisfy the following inequality expressions: 50w−18.5≤v≤50w−15.5 and −12.5w+39.125≤v≤−62.5w+86.125, and x satisfy the following inequality expression: −(62.5w+v −81.625)/15+0.5≤x≤−(62.5w+v−81.625)/15+0.8; a high-temperature heat treatment step of heating the magnet to a temperature of 730° C. or higher and 1,020° C. or lower, and then cooling to 300° C. at a cooling rate of 20° C./min; and a low-temperature heat treatment step of heating the magnet to a temperature of 440° C. or higher and 550° C. or lower.
Public/Granted literature
- US20160284468A1 METHOD FOR PRODUCING R-T-B BASED SINTERED MAGNET Public/Granted day:2016-09-29
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