Invention Grant
- Patent Title: Methods of forming imprint patterns
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Application No.: US15677347Application Date: 2017-08-15
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Publication No.: US10656540B2Publication Date: 2020-05-19
- Inventor: Wooyung Jung
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon-si, Gyeonggi-do
- Assignee: SK hynix Inc.
- Current Assignee: SK hynix Inc.
- Current Assignee Address: KR Icheon-si, Gyeonggi-do
- Agency: William Park & Associates LTD.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@52e62a54
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03F7/00

Abstract:
A method of forming patterns is provided. The method may include forming a resist layer on a substrate and curing an extrusion confining pattern to define anchoring regions in the resist layer. The template may overlay over the resist layer. the template may include transfer patterns and anchor patterns. The template may be pressed to imprint the anchor patterns on the anchoring regions and to imprint the transfer patterns on a portion of the resist layer. An alignment may be performed to align the template with the resist layer.
Public/Granted literature
- US20180210352A1 METHODS OF FORMING IMPRINT PATTERNS Public/Granted day:2018-07-26
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