An object of the present invention is to provide a resist stripper for stripping resist from a substrate with a metallic line and/or a metal oxide film, which has excellent stripping properties and shows reduced reattachment of stripped resist, and which is also excellent in antifoaming properties. The resist stripper contains: (A) an amine; (B) an organic solvent; and (C) 5.0 wt % or less of a sulfonic or carboxylic acid having a weight average molecular weight of 5,000 to 1,000,000 or a salt thereof, and the resist stripper is free of (D) water, or contains (D) 60 wt % or less of water.