Invention Grant
- Patent Title: Charged particle beam device
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Application No.: US16089269Application Date: 2016-03-31
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Publication No.: US10651004B2Publication Date: 2020-05-12
- Inventor: Yasuhiro Shirasaki , Momoyo Enyama
- Applicant: HITACHI, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI, LTD.
- Current Assignee: HITACHI, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- International Application: PCT/JP2016/060781 WO 20160331
- International Announcement: WO2017/168709 WO 20171005
- Main IPC: H01J37/05
- IPC: H01J37/05 ; H01J37/26 ; H01J37/147 ; H01J37/153 ; H01J37/28

Abstract:
A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, includes: an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam; a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein; a correction mechanism that is placed off of a trajectory of the primary charged particle beam but on a trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through; and a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.
Public/Granted literature
- US20190131104A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2019-05-02
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