Invention Grant
- Patent Title: Methods for patterning a magnetic sensing layer
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Application No.: US15219694Application Date: 2016-07-26
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Publication No.: US10593869B2Publication Date: 2020-03-17
- Inventor: Harianto Wong , William P. Taylor
- Applicant: Allegro MicroSystems, LLC
- Applicant Address: US NH Manchester
- Assignee: Allegro MicroSystems, LLC
- Current Assignee: Allegro MicroSystems, LLC
- Current Assignee Address: US NH Manchester
- Agency: Daly, Crowley, Mofford & Durkee LLP
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L43/12 ; H01L43/10 ; H01L43/02 ; G01R33/09

Abstract:
The present disclosure is directed towards a method for patterning a magnetic sensing layer. The method includes disposing a protective layer on a first of a substrate, disposing a first insulating layer on a first surface of protective layer. An opening is formed in the first insulating layer to expose the first surface of the protective layer. A magnetic sensing layer is disposed over the first insulating layer and a predetermined portion of the first surface of the protective layer within the opening. A second insulating layer can be disposed over the magnetic sensing layer. The second insulation layer and the magnetic sensing layer can be removed from the first insulation layer. Thus, the opening includes the magnetic sensing layer and the second insulation layer after the removal of the second insulation layer and magnetic sensing layer from the first insulation layer.
Public/Granted literature
- US20180033955A1 Methods For Patterning A Magnetic Sensing Layer Public/Granted day:2018-02-01
Information query
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