A semiconductor device includes a semiconductor body having a first silicon carbide region and a second silicon carbide region which forms a pn-junction with the first silicon carbide region, a first metallization on a front side of the semiconductor body, a contact region that forms an Ohmic contact with the second silicon carbide region, and a barrier-layer between the first metallization and the contact region and that is in Ohmic connection with the first metallization and the contact region. The barrier-layer forms a Schottky-junction with the first silicon carbide region, and includes molybdenum nitride or tantalum nitride. Additional semiconductor device embodiments and corresponding methods of manufacture are described.