Invention Grant
- Patent Title: Field effect transistor (FET) structure with integrated gate connected diodes
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Application No.: US16135606Application Date: 2018-09-19
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Publication No.: US10593665B2Publication Date: 2020-03-17
- Inventor: John P. Bettencourt , Raghuveer Mallavarpu
- Applicant: Raytheon Company
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Daly, Crowley, Mofford & Durkee, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L27/06 ; H01L21/8232 ; H01L29/872 ; H01L29/812 ; H01L29/06 ; H03F1/32 ; H01L21/8234 ; H01L29/10 ; H01L29/20 ; H01L29/47 ; H01L29/778 ; H03F1/56 ; H03F3/195 ; H03F3/213 ; H01L29/08 ; H01L21/8252

Abstract:
A structure having: a plurality of field effect transistors (FETs) connected between a common input and a common output, each one of the field effect transistors comprises: a source region, a drain region, and a gate electrode for controlling carriers through a channel region of a transistor region of the structure between the source region and the drain region; a plurality of diodes, each one of the diodes being associated with a corresponding one of the plurality of FETs, each one of the diodes having an electrode in Schottky contact with a diode region of the corresponding one of the FETs. The gate electrode and the diode electrode extend along parallel lines. The source region, the drain region, the channel region, and a diode region having therein the diode are disposed along a common line.
Public/Granted literature
- US20190019790A1 FIELD EFFECT TRANSISTOR (FET) STRUCTURE WITH INTEGRATED GATE CONNECTED DIODES Public/Granted day:2019-01-17
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