Invention Grant
- Patent Title: Compensation method for Mura
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Application No.: US16321827Application Date: 2018-09-29
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Publication No.: US10593262B2Publication Date: 2020-03-17
- Inventor: Xianming Zhang
- Applicant: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Leong C. Lei
- Priority: CN201810854442 20180730
- International Application: PCT/CN2018/108572 WO 20180929
- Main IPC: G06F1/00
- IPC: G06F1/00 ; G09G3/3225 ; G09G3/36

Abstract:
The present disclosure relates to a Mura compensation method, including: obtaining a first image, obtaining an initial Mura compensation value M0 of each Mura pixel, determining whether the initial Mura compensation value M0 satisfies a relation −N≤M0≤N, configuring the initial Mura compensation value as a target Mura compensation value, determining whether a maximum value M1 and a minimum value M2 satisfy a relation M2>0, N 0, N
Public/Granted literature
- US20200035152A1 COMPENSATION METHOD FOR MURA Public/Granted day:2020-01-30
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