Invention Grant
- Patent Title: Ferroelectric memory and capacitor structure thereof
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Application No.: US16380150Application Date: 2019-04-10
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Publication No.: US10586582B2Publication Date: 2020-03-10
- Inventor: Fu-Chou Liu , Yung-Tin Chen
- Applicant: NuStorage Technology Co., Ltd.
- Applicant Address: WS Apia
- Assignee: NUSTORAGE TECHNOLOGY CO., LTD.
- Current Assignee: NUSTORAGE TECHNOLOGY CO., LTD.
- Current Assignee Address: WS Apia
- Agency: WPAT, PC
- Priority: CN201710449284 20170614
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01G4/08 ; H01L27/108 ; H01G4/01 ; H01L27/11504 ; H01L27/11507 ; H01G4/40 ; H01G7/06

Abstract:
A selected ferroelectric memory cell of a ferroelectric memory is electrically connected to a first bit line, a second bit line, a first word line, a second word line and a plate line. The selected ferroelectric memory cell includes a first field effect transistor (“FET”), a second FET and a ferroelectric capacitor. A control terminal and a first access terminal of the first FET are electrically connected to the first word line and the first bit line, respectively. A control terminal and a first access terminal of the second FET are electrically connected to the second word line and the second bit line, respectively. A second access terminal of the first FET is electrically connected to a first capacitor electrode of the ferroelectric capacitor and a second access terminal of the second FET. A second capacitor electrode of the ferroelectric capacitor is electrically connected to the plate line.
Public/Granted literature
- US20190237121A1 FERROELECTRIC MEMORY AND CAPACITOR STRUCTURE THEREOF Public/Granted day:2019-08-01
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