Invention Grant
- Patent Title: Magnetoresistance effect element
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Application No.: US15371987Application Date: 2016-12-07
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Publication No.: US10580974B2Publication Date: 2020-03-03
- Inventor: Tomoyuki Sasaki
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2015/242355 20151211
- Main IPC: H01L43/10
- IPC: H01L43/10 ; G01R33/09 ; G11B5/39 ; G11C11/16 ; H01F10/12 ; H01F10/32

Abstract:
A magnetoresistance effect element is provided in which a MR ratio is not likely to decrease even at a high bias voltage. A magnetoresistance effect element according to an aspect of the present invention includes: a first ferromagnetic metal layer; a second ferromagnetic metal layer; a tunnel barrier layer that is provided between the first ferromagnetic metal layer and the second ferromagnetic metal layer, in which the tunnel barrier layer is formed of a non-magnetic oxide having a cubic crystal structure represented by a compositional formula A1-xA′xO (A represents a divalent cation, and A′ represents a trivalent cation), a space group of the crystal structure is any one selected from the group consisting of Pm3m, I-43m, and Pm-3m, and the number of A ions is more than the number of A′ ions in a primitive lattice of the crystal structure.
Public/Granted literature
- US20170170392A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2017-06-15
Information query
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