Invention Grant
- Patent Title: Sealed cavity structures with non-planar surface features to induce stress
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Application No.: US15947364Application Date: 2018-04-06
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Publication No.: US10580893B2Publication Date: 2020-03-03
- Inventor: Siva P. Adusumilli , Steven M. Shank , Anthony K. Stamper , John J. Ellis-Monaghan
- Applicant: GLOBALFOUNDRIES INC.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Roberts Mlotkowski Safran Cole & Calderon, P.C.
- Agent David Cain; Andrew M. Calderon
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L21/762 ; H01L21/84 ; H01L21/324 ; H01L23/10 ; H01L29/06 ; H01L29/10 ; H01L27/12 ; H01L21/02 ; H01L21/8238
Abstract:
The present disclosure relates to semiconductor structures and, more particularly, to sealed cavity structures having a non-planar surface features and methods of manufacture. The structure includes a cavity formed in a substrate material. The cavity is covered with epitaxial material that has a non-planar surface topography which imparts a stress component on a transistor.
Public/Granted literature
- US20190312142A1 SEALED CAVITY STRUCTURES WITH NON-PLANAR SURFACE FEATURES TO INDUCE STRESS Public/Granted day:2019-10-10
Information query
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