Invention Grant
- Patent Title: Alternating hardmasks for tight-pitch line formation
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Application No.: US16058088Application Date: 2018-08-08
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Publication No.: US10580652B2Publication Date: 2020-03-03
- Inventor: John C. Arnold , Anuja E. DeSilva , Nelson M. Felix , Chi-Chun Liu , Yann A. M. Mignot , Stuart A. Sieg
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US CA San Jose
- Assignee: Tessera, Inc.
- Current Assignee: Tessera, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/033
- IPC: H01L21/033 ; H01L21/308 ; H01L21/311 ; H01L21/3213 ; H01L29/66 ; H01L21/8234

Abstract:
Methods of forming fins include masking a region on a three-color hardmask fin pattern, leaving a fin of a first color exposed. The exposed fin of the first color is etched away with a selective etch that does not remove fins of a second color or a third color. The mask and all fins of a second color are etched away. Fins are etched into a fin base layer using the fins of the first color and the fins of the third color.
Public/Granted literature
- US20180350600A1 ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION Public/Granted day:2018-12-06
Information query
IPC分类: