Invention Grant
- Patent Title: Method and apparatus for sampling pattern generation for a ray tracing architecture
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Application No.: US16167462Application Date: 2018-10-22
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Publication No.: US10580201B2Publication Date: 2020-03-03
- Inventor: David R. Baldwin
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Nicholson De Vos Webster & Elliott LLP
- Main IPC: G06T15/50
- IPC: G06T15/50 ; G06T11/40 ; G06T15/00 ; G06T15/06 ; G06T15/80

Abstract:
An apparatus and method for sampling pattern generation in a ray tracing architecture. For example, one embodiment of a graphics processing apparatus comprises: a ray generation circuit to generate a ray stream from one or more image tiles; and a sample pattern generation circuit to generate samples for rays in the ray stream, the samples generated to exhibit at least some randomness across pixels of a given frame but be repeatable across multiple frames.
Public/Granted literature
- US20190057543A1 METHOD AND APPARATUS FOR SAMPLING PATTERN GENERATION FOR A RAY TRACING ARCHITECTURE Public/Granted day:2019-02-21
Information query
IPC分类:
G | 物理 |
G06 | 计算;推算或计数 |
G06T | 一般的图像数据处理或产生 |
G06T15/00 | 3D〔三维〕图像的加工 |
G06T15/50 | .发光效果 |