Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
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Application No.: US16431789Application Date: 2019-06-05
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Publication No.: US10579271B2Publication Date: 2020-03-03
- Inventor: Takuya Futatsuyama
- Applicant: Toshiba Memory Corporation
- Applicant Address: JP Minato-ku
- Assignee: Toshiba Memory Corporation
- Current Assignee: Toshiba Memory Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-98416 20090414
- Main IPC: G06F3/06
- IPC: G06F3/06 ; G11C16/04 ; G11C11/56 ; G11C16/10 ; G11C16/34

Abstract:
A nonvolatile semiconductor memory device comprises a cell unit including a first and a second selection gate transistor and a memory string provided between the first and second selection gate transistors and composed of a plurality of serially connected electrically erasable programmable memory cells operative to store effective data; and a data write circuit operative to write data into the memory cell, wherein the number of program stages for at least one of memory cells on both ends of the memory string is lower than the number of program stages for other memory cells, and the data write circuit executes the first stage program to the memory cell having the number of program stages lower than the number of program stages for the other memory cells after the first stage program to the other memory cells.
Public/Granted literature
- US20190286323A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2019-09-19
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